ICPST-42 (2025) PROGRAM
Time Table of ICPST-42 (latest version: 20250530)
ICPST42 Time Table v20250530.pdf [128.0 KB]
Program of ICPST-42 (latest version: 20250530-2)
ICPST-42 (2025) Program v20250530-2.pdf [820.9 KB]
Announcement of Changes to Session Chairpersons and Presenters
Chair person
June 26th, Medium hall, 16:10-16:30
Yoshio Kawai (Shin-Etsu chemical) -> Kenji Yoshimoto (Kanazawa University)
Presenter
June 27th, Medium hall, 10:55-11:25, A05-04
Rachel Snyder -> Shintaro Yamada
TIME TaBLE of ICPST-42
Tuesday, June 24, 2025
| Medium Hall | |
| 13:00 | Tutorial 13:00-18:00 |
| 13:30 | |
| 14:00 | |
| 14:30 | |
| 15:00 | |
| 15:30 | |
| 16:00 | |
| 16:30 | |
| 17:00 | |
| 17:30 | |
| 18:00 | Welcome Reception 18:00-20:00 |
| 18:30 | |
| 19:00 | |
| 19:30 | |
| 20:00 |
Wednesday, June 25, 2025
| Medium Hall | Small Hall | Room 408 | Room 409 | |
| 9:30 | Opening Remarks 9:30-9:45 | |||
| 9:45 | SPST Award Ceremony 9:45-10:00 | |||
| 10:00 | ||||
| 10:30 | A0. Plenary Talks 10:00-11:30 | |||
| 11:00 | ||||
| 11:30 | Lunch | |||
| 12:00 | ||||
| 12:30 | ||||
| 13:00 | A3.Directed Self Assembly (DSA)13:00-17:30 | A2.Nanobiotechnology13:00-17:30 | A6.Nanoimprint12:50-16:30 | |
| 13:30 | A12.Fundamentals and Applications of Biomimetics Materials and Processes13:30-16:50 | |||
| 14:00 | ||||
| 14:30 | ||||
| 15:00 | ||||
| 15:30 | ||||
| 16:00 | ||||
| 16:30 | A8.
Photopolym. in 3-D Printing/ |
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| 17:00 | ||||
| 17:30 | Coffee Break
with snacks |
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| 18:00 | Panel
Discussion |
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| 18:30 | ||||
| 19:00 | ||||
| 19:30 | ||||
| 20:00 | ||||
Thursday, June 26, 2025
Thursday, June 26, 2025
| Medium Hall | Small Hall | Room 408 | Room 409 | |
| 9:00 | A5.EUV Lithography 9:00-11:30 |
A9. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices 9:00-16:40 |
B2. Plasma Photochemistry and Functional-ization of Polymer Surfaces (Japanese symposium) 9:30-12:00 |
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| 9:30 | ||||
| 9:45 | ||||
| 10:00 | B3-5. General Scopes of Photopolymer Science and Technology (Japanese Symposium) 10:00-12:15 |
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| 10:30 | ||||
| 11:00 | ||||
| 11:30 | A4. Computational / Analytical Approach for Lithography Processes 11:30-16:00A7.193 nm Lithography Extension 16:10-16:30 |
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| 12:00 |
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| 12:30 | Lunch | |||
| 13:00 | A13. + B1. Polyimides and High Thermally Stable Resins -Functionalization and Practical Applications 13:00-16:30 |
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| 13:30 | ||||
| 14:00 | ||||
| 14:30 | ||||
| 15:00 | ||||
| 15:30 | ||||
| 16:00 | ||||
| 16:30 | ||||
| 17:00 | ||||
| 17:30 | Banquet at Hotel Monterey Himeji 17:30-20:00 |
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| 18:00 | ||||
| 18:30 | ||||
| 19:00 | ||||
| 19:30 | ||||
| 20:00 | ||||
Friday, June 27, 2025
| Medium Hall | Small Hall | Room 408 | Room 409 | |||
| 9:00 | A5. EUV Lithography9:00-16:40 |
A11. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices 9:00-16:45 |
B3. General Scopes of Photopolymer Science and Technology (Japanese Symposium) 9:00-11:00 |
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| 9:30 | ||||||
| 9:45 | ||||||
| 10:00 | ||||||
| 10:30 | ||||||
| 11:00 | ||||||
| 11:30 | ||||||
| 12:00 | ||||||
| 12:30 | ||||||
| 13:00 | A10. Chemistry for Advanced Photopolymer Science13:00-16:05 |
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| 13:30 | ||||||
| 14:00 | ||||||
| 14:30 | ||||||
| 15:00 | ||||||
| 15:30 | ||||||
| 16:00 | ||||||
| 16:30 | Closing Remarks
16:45-16:55 |
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| 17:00 | ||||||
ICPST-42 Program
Program on Tuesday, June 24
Medium Hall on Tuesday, June 24
| Tutorial | Time | Duration
Number |
TutorialTopics (General Review) | Lecturers | |
| Tutorial: Basics of Lithography Materials Science and Technology(Language of tutorial: Japanese or English) |
Chairperson: Seiji Nagahara (ASML Japan),
Teruaki Hayakawa (Institute of Science Tokyo) |
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| 13:00-13:05 | 5 min
TU1 |
Opening remark from SPST | Takao Watanabe (University of Hyogo) 渡邊 健夫（兵庫県立大学） |
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| 13:05-13:10 | 5 min
TU2 |
Opening remark from TAPJ | Hideo Horibe (Osaka Metropolitan University) 堀邊 英夫（大阪公立大学） |
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| 13:10-13:35 | 25 min
TU3 |
History of the Semiconductor Industry and Development of Chemical Amplification Three-Component Resists |
Hideo Horibe (Osaka Metropolitan University) 堀邊 英夫（大阪公立大学） |
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| 13:35-14:00 | 25 min
TU5 |
From Visible to Extreme UV: The Evolution of Information Transfer in Semiconductor Projection Lithography |
John Peterson (imec) | ||
| 14:00-14:20 | 20 min
TU6 |
i-line resist: History and Design Principle | Makoto Hanabata (Photofunctional Materials Research Co., Ltd.) 花畑 誠（光機能材料研究所） |
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| 14:20-14:40 | 20 min | Break | |||
| Chairperson: Takao Watanabe (University of Hyogo),
Hideo Horibe (Osaka Metropolitan University) |
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| 14:40-15:10 | 30 min
TU7 |
KrF/ArF/ArFi/EB/EUV Chemically Amplified Resist (CAR); (PTD, NTD, developer) | Toru Fujimori (Hitachi High-Tech) 藤森 亨（株式会社 日立ハイテク） |
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| 15:10-15:35 | 25 min
TU8 |
Basics and Recent Advances of Photo-Acid Generators | Tomotaka Tsuchimura (Fuji Film) 土村 智孝（富士フイルム株式会社） |
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| 15:35-16:00 | 25 min
TU9 |
Early Metal-Containing Resists for EUV Lithography | Robert Brainard (SUNY) | ||
| 16:00-16:20 | 20 min | Break | |||
| Chairperson: Seiji Nagahara (ASML Japan),
Toru Fujimori (Hitachi High-Tech) |
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| 16:20-16:40 | 20 min
TU10 |
Resist filtering technology | Toru Umeda (Nihon Pall) 梅田 徹（日本ポール株式会社） |
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| 16:40-17:10 | 30 min
TU11 |
Basics of BARC, SOC, TC, MHM, rinse, shrink material | Tomohide Katayama (Merck) 片山 朋英（メルクエレクトロニクス株式会社） |
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| 17:10-17:45 | 35 min
TU12 |
Special Keynote Tutorial Talk:
Process technology for evolving 3D stacked CMOS image sensors |
Hayato Iwamoto (Sony Semiconductor Solutions) 岩元 勇人（ソニーセミコンダクタソリューションズ株式会社） |
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| 17:45-17:50 | 5 min
TU13 |
Closing remark | Seiji Nagahara (ASML Japan) 永原 誠司（ASML Japan） |
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| 17:50-18:00 | 10 min | Break | |||
| Welcome Reception | 18:00-20:00 | 120 min | Welcome Reception (Get together party) with light meals (Free of charge) | At Foyer in front of Medium Hall | |
Program on Wednesday, June 25
Medium Hall on Wednesday, June 25
| Symposium | Time | Number | Presentation Title | Authors | |
| Opening Remarks | 9:30-9:45 | OP | Opening Remarks | Takeo Watanabe SPST |
|
| SPST Award Ceremony |
9:45-10:00 | AC | SPST Award Ceremony | Takeo Watanabe, SPST Itaru Osaka, SPST |
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| A0. Plenary talk | Chairperson:Takeo Watanabe (University of Hyogo),
Seiji Nagahara (ASML Japan) |
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| 10:00-10:45 | A00-01 | EUV Lithography; past, present and future
(JPST vol.38 No4 p263) |
Jos Benschop ASML, the Netherlands |
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| 10:45-11:30 | A00-02 | EUV History, current status and prospect for EUV Lithography | Takeo Watanabe University of Hyogo, Japan |
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| 11:30-13:00 | Lunch | ||||
| A3. Direct Self Assembly (DSA) | Chairpersons: Seiji Nagahara (ASML Japan),
Redouane Borsali (Polynat Carnot Institute) |
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| 13:00-13:40 | A03-01 | IR-AFM metrology on latent images in DSA and EUVL photoresist (Keynote)
(JPST vol.38 No3 p253) |
Diederik Maas 1, Maarten van Es 1, Komal Pandey 1, Adam (Chung Bin) Chuang 1, Takehiro Seshimo 2, and Teruaki Hayakawa 3 1 Netherlands Organisation for Applied Scientific Research – TNO, the Netherlands, 2 Tokyo Ohka Kogyo Co. Ltd., Japan, 3 Institute of Science Tokyo, Japan |
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| 13:40-14:00 | A03-02 | Strategic Development of High-Chi Materials for Directed Self-Assembly | Shota Iino, Takehiro Seshimo, Ken Miyagi, Takahiro Dazai, and Kazufumi Sato, Tokyo Ohka Kogyo Co., Ltd., Japan |
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| 14:00-14:20 | A03-03 | Development of PS-PMMA Block Copolymers Incorporating Poly(n-butyl methacrylate) for Low Temperature Thermal Annealing toward Perpendicular Microdomain Alignment
(JPST vol.38 No3 p223) |
Hsi-Chih Wang 1,Takehiro Seshimo 2, Takahiro Dazai 2, Kazufumi Sato 2, Kan Hatakeyama-Sato 1, Yuta Nabae 1, and Teruaki Hayakawa 1 1 Institute of Science Tokyo, Japan, 2 Tokyo Ohka Kogyo Co., Ltd., Japan |
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| 14:20-14:40 | Coffee Break | ||||
| Chairpersons: Teruaki Hayakawa (Institute of Science Tokyo),
Diederik Maas (TNO) |
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| 14:40-15:10 | A03-04 | Self-assembly of Carbohydrate Block Copolymers: From Glyconanoparticles to thin films to photonic crystals (Invited) |
Redouane Borsali Polynat Carnot Institute, France |
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| 15:10-15:30 | A03-05 | The effect of side-chain modification via hydrogen bonding on the microphase-separated structure of PS-b-P4VP-b-PMMA
(JPST vol.38 No3 p205) |
Ryota Uehara 1, Shinsuke Maekawa 1, Takehiro Seshimo 2, Ryutaro Sugawara 2, Takahiro Dazai 2, Kazufumi Sato 2, Kan Hatakeyama-Sato 1, Yuta Nabae 1, and Teruaki Hayakawa 1 1 Institute of Science Tokyo, Japan, 2 Tokyo Ohka Kogyo Co., Ltd., Japan |
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| 15:30-15:50 | A03-06 | Preparation of metal-containing BCP thin film | Desheng Zhan, Zhenyu Yang, Xiaofei Qian, Guangya Wu, and Hai Deng Fudan University, China |
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| 15:50-16:10 | Coffee Break | ||||
| Chairpersons: Takehiro Seshimo (Tokyo Ohka Kogyo Co. Ltd.),
Dustin W. Janes (TEL Technology Center, America) |
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| 16:10-16:30 | A03-07 | Synthesis of polymeric photoacid generator with sub-10nm patterning capability | Tao Liu, Zhenyu Yang, Xiaofei Qian, and Hai Deng Fudan University, China |
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| 16:30-16:50 | A03-08 | Solvent Annealing of Fluorine-Containing Block Copolymers to Control Orientation | Hongyi Tang, Xuemiao Li, Xiaofei Qian, and Hai Deng Fudan University, China |
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| 16:50-17:10 | A03-09 | Molecular assembly and disassembly of AIE-active triangular chromophores | Pyae Thu 1, Hiroki Nakanishi 2 and Mina Han 1,2 1 Kongju National University, Korea, 2 Tottori University, Japan |
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| 17:10-17:30 | A03-10 | Interactions of AIE-active silole derivatives with linear and trigonal azo chromophores | Mina Han 1, Pyae Thu 1, Min Kyoung Kim 2, and Young Tae Park 2 1 Kongju National University, Korea, 2 Keimyung University, Korea |
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| 17:30-18:00 | Coffee Break (with light meals) | At Foyer in front of Medium Hall | |||
| Panel Discussion |
18:00-20:00 | PD | Panel Discussion | ||
Small Hall on Wednesday, June 25
| Symposium | Time | Number | Presentation Title | Authors | |
| A2. Nanobiotechnology | Chairpersons: Kensuke Osada (NIQST), Gao Shan (NIQST) | ||||
| 13:00-13:30 | A02-01 | Photo-responsive cell anchoring surface for single-cell phenotype analysis (Invited) | Satoshi Yamaguchi Osaka University, Japan |
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| 13:30-14:00 | A02-02 | Bio Roll-Up: Self-Assembly of Hydrogel Photoresists (Invited)
(JPST vol.38 No3 p187) |
Shaheen Hasan 1, Chase Brisbois 2, Kelly Carufe 3, Abigail Johnson 2, Julia Garrison 2, Lauren Sfakis 2, Victoria Brunner 2, McKenzie Albrecht 4, Aishwarya Panneerselvam 2, Yubing Xie 2, and Robert Brainard 2 1 Rensselaer Polytechnic Institute, USA, 2 University at Albany, USA, 3 Yale University, USA, 4 SUNY Polytechnic, USA |
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| 14:00-14:20 | A02-03 | Photomodifiable azopolymer nanotopography for applications in cell biology | John T. Fourkas, Mona Abdelrahman, Wolfgang Losert, Jerry Shen, Nikos Liaros, and Jeffrey Taylor University of Maryland, USA |
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| 14:20-14:40 | A02-04 | Elastoplastic analysis of deformation of poly(L-lactic acid) microneedle
(JPST vol.38 No4 p291) |
Yukihiro Kanda1,2, Hiroaki Takehara1,2, and Takanori Ichiki1,2 1 The University of Tokyo, Japan, 2 Innovation Center of NanoMedicine (iCONM), Japan |
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| 14:40-15:10 | A02-05 | Optimal radiation dose to induce the abscopal effect through the combination of carbon-ion radiotherapy and immune checkpoint therapy (Invited) |
Liqiu Ma 1,2, Lin Xie 1, Kensuke Osada 1, Yukari Yoshida 2, Akihisa Takahashi 2 and Takashi Shimokawa 1 1 Institute for Quantum Medical Science, National Institutes for Quantum Science and Technology (QST), Japan, 2 Gunma University Heavy Ion Medical Center, Japan |
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| 15:10-15:30 | Coffee Break | ||||
| Chairpersons: Yukihiro Kanda (iCONM), Takanori Ichiki (Univ. of Tokyo) | |||||
| 15:30-16:00 | A02-06 | Lipid Nanodiscs Formed by Lipoprotein-Mimetic Polymers and Their Applications in Drug Delivery (Invited) |
Kazuma Yasuhara Nara Institute of Science and Technology, Japan |
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| 16:00-16:30 | A02-07 | Nano-Sized Contrast Agent Based on a Novel Self-Folding Macromolecular Architecture for MRI-Based Cancer Diagnosis (Invited) |
Shan Gao 1, Yutaka Miura 2, Akira Sumiyoshi 1, Nobuhiro Nishiyama 2, Ichio Aoki 1 and Kensuke Osada 1 1 National Institutes for Quantum Science and Technology (QST), Japan, 2 Institute of Science Tokyo, Japan |
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| 16:30-16:50 | A02-08 | Accumulation of nanoruler polymer-based probe in the inflammaging model mice for the MRI diagnosis of chronic inflammation. |
Nanami Maehara 1, Kae Sato 2, Mitsuru Naito 3, Kanjiro Miyata 3, Akiko Takahashi 4, and Kensuke Osada 1 1 National Institutes for Quantum Science and Technology (QST), 2 Japan Women’s University, Japan, 3 The University of Tokyo, Japan, 4 Japanese Foundation for Cancer Research, Japan |
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| 16:50-17:10 | A02-09 | Evaluation of the effectiveness of exosome heterogeneous fractionation analysis using a combination of FFE and NTA |
Shusuke Sato 1, and Takanori Ichiki 1,2 1 Innovation Center of NanoMedicine, Japan, 2 The University of Tokyo, Japan |
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| 17:10-17:30 | A02-10 | Comparative Study of Piezoelectric Properties in Poly-L-Lactic Acid (PLLA) and Polyvinylidene Fluoride (PVDF) Nanofibers |
Qi Kang, Hiroaki Takehara and Takanori Ichiki The University of Tokyo, Japan |
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Room 408 on Wednesday, June 25
| Symposium | Time | Number | Presentation Title | Authors | |
| A6. Nanoimprint | Chairpersons: Yoshihiko Hirai (Osaka Metropolytan University), Jun Taniguchi (Tokyo University of Science) |
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| 12:50-13:20 | A06-01 | Optical polymer wafers for waveguide of AR Glasses (Invited) | Akifumi Aono, Eiichiro Hikosaka, Takeshi Shinkai, Takashi Kasai, and Akihiro Muramatsu Mitsui Chemicals, Inc., Japan |
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| 13:20-13:50 | A06-02 | High Refractive Index Polymers for Advanced Photonics: Opportunities and Challenges | C. Pina-Hernandez, K. Yamada, A. Legacy, and K. Munechika High RI Optics, USA |
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| 13:50-14:10 | A06-03 | Development of TiO₂-SiO₂ radical-based gas-permeable mold for application in UV nanoimprint lithography
(JPST vol.38 No4 p303) |
Misaki Oshima1, Mayu Morita 1, Mano Ando 1, Rio Yamagishi 1, Sayaka Miura 1, Naoto Sugino 2, and Satoshi Takei 1 1 Toyama Prefectural University, Japan, 2 Sanko Gosei LTD., Japan |
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| 14:10-14:30 | A06-04 | Fabricating of the structure with partially different wettability incorporating the moth-eye structure and the applications |
Takuto Wakasa and Jun Taniguchi Tokyo University of Science, Japan |
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| 14:30-14:50 | A06-05 | Fabrication of Rose Petal effect Surface using photosensitive polyimide and nanoimpring | Yoritaka Danjo, and Jun Taniguchi Tokyo University of Science, Japan |
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| 14:50-15:00 | Coffee Break | ||||
| 15:00-15:30 | A06-06 | Nanoimprinting Lithography as Permanent Imprint or Etching Mask (Invited) | Thomas Achleitner EV Group, Austria |
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| 15:30-15:50 | A06-07 | Three-dimensional patterning technique for nanoimprint mold by dwell-time algorithms with iterative blind deconvolution method |
Noriyuki Unno, Ryunosuke Komine, Jun Taniguchi, and Shin-ichi Satake Tokyo University of Science, Japan |
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| 15:50-16:10 | A06-08 | Fabrication of environmentally friendly biodegradable polylactic acid microstructures by micro-injection molding using amine-containing gas-permeable hybrid molds
(JPST vol.38 No4 p269) |
Mayu Morita 1, Misaki Oshima 1, Arisa Teramae 1, Sayaka Miura 1, Rio Yamagishi 1, Naoto Sugino 2, Yoshiyuki Yokoyama 3, and Satoshi Takei 1, 1 Toyama Prefectural University, Japan, 2 Sanko Gosei LTD., Japan, 3 Toyama Industrial Technology Research and Development Center, Japan |
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| 16:10-16:30 | A06-09 | Low-Temperature Nanoimprint Lithography for Advanced Microneedles in Temperature-Sensitive Drug Delivery |
Sen Lean Goo, Rio Yamagishi, Sayaka Miura, and Satoshi Takei Toyama Prefectural University, Japan |
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| A8. Photopolymers in 3-D Printing/ Additive Manufacturing | Chairpersons: Takumi Ueno (Shinshu Univ.),
Masaru Mukai (Tokyo Univ. of Science) |
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| 16:30-17:00 | A08-01 | Initiator-free recyclable resin available for two-photon lithography (Invited) | Masaru Mukai, Wakana Miyadai, and Shoji Maruo Yokohama National University, Japan |
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| 17:00-17:20 | A08-02 | Physics-based deep learning network for parallelized two-photon polymerization lithography using a spatial light modulator |
Valeriia Sedova 1, Thomas Le Deun 2, Joel Rovera 2, Jonas Wiedenmann 3, Kevin Heggarty 2, and Andreas Erdmann 1 1 Fraunhofer Institute for Integrated Systems and Device Technology,Germany, 2 IMT Atlantique,France, 3 Heidelberg Instruments Mikrotechnik GmbH,Germany |
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| 17:20-17:40 | A08-03 | Photopolymers with Enhanced Thermomecanical Properties for 3D Printing Applications | Céline Croutxé-Barghorn, Lucile Halbardier, Emile Goldbach, and Xavier Allonas University of Haute-Alsace, France |
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Room 409 on Wednesday, June 25
| Symposium | Time | Number | Presentation Title | Authors | |
| A12. Fundamentals and Applications of Biomimetics Materials and Processes | Chairpersons: Atsushi Sekiguchi (LTJ),
Takayuki Murosaki (Asahikawa medical Univ.) |
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| 13:30-13:55 | A12-01 | Superhydrophobic PDMS using femtosecond laser-processed surface molds for anti-icing (Invited)
(JPST vol.38 No2 p91) |
Toshimitsu Sakurai 1, Toshihiro Somekawa 2, Yuji Hirai 3, and Hiroki Matsushita 1 1 Civil Engineering Research Institute for Cold Region (CERI), Japan, 2 Osaka University, Japan, 3 Chitose Institute of Science and Technology, Japan |
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| 13:55-14:15 | A12-02 | Antibacterial property of Si Nanopillars for anti-microbial resistance (AMR) bacteria
(JPST vol.38 No2 p85) |
Takeshi Ito 1, Yushi Yanagisawa 1, Go Yamamoto 2, Shigeo Hamaguchi 2, Satoshi Kutsuna 2, Tomohiro Shimizu 1, and Shoso Shingubara 1 1 Kansai Univerisity, Japan, 2 Osaka University, Japan |
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| Charipersons: Takayuki Murosaki (Asahikawa Medical Univ.),
Fujio Tsumori (Kyushu Univ.) |
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| 14:15-14:35 | A12-03 | Development of antimicrobial adhesion-resistant surfaces by using COP nanopillar structures | Zihao Zhao, Tomohiro Shimizu, Shoso Shingubara, and Takeshi Ito Kansai University, Japan |
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| 14:35-14:55 | A12-04 | Practical Biomimetic Frameworks with Specific Case Studies for Extracting and Applying Biological Solutions
(JPST vol.38 No2 p99) |
Satoru Tachibana Kyoto University, Japan |
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| 14:55-15:10 | Coffee Break | ||||
| Chairpersons: Takeshi Ito (Kansai Univ.),
Masashi Yamamoto (National Institute of Technology, Kagawa College) |
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| 15:10-15:30 | A12-05 | Wettability Control of Ceramic Surfaces with Hierarchical Nano/Micro-patterns
(JPST vol.38 No3 p173) |
Shotaro Manabe, and Fujio Tsumori Kyushu University, Japan |
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| 15:30-15:50 | A12-06 | Magnetically-Actuated Dynamic Culture System for Investigating Mechanical Effects on Biological Growth
(JPST vol.38 No2 p131) |
Nako Okamoto, and Fujio Tsumori Kyushu University, Japan |
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| 15:50-16:10 | A12-07 | High Packing Efficient Deployment Method Using Swelling Hydrogels Inspired by Out-of-Plane Biological Deformation
(JPST vol.38 No3 p181) |
Akito Nagaoka, and Fujio Tsumori Kyushu University, Japan |
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| Chairpersons: Fujio Tumori (Kyushu Univ.), Takeshi Ito (Kansai Univ.) | |||||
| 16:10-16:30 | A12-08 | Analysis of barnacle exploring behavior on surfaces with different functional groups | Takayuki Murosaki 1, Shota Asano 2, Yasuyuki Nogata 3, and Yuji Hirai 4 1 Asahikawa Medical University, Japan, 2 Graduate School of Science and Technology, CIST, Japan, 3 Central Research Institute of Electric Power Industry, Japan, 4 Chitose Institute of Science and Technology, Japan |
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| 16:30-16:50 | A12-09 | Effect of Oxygen Addition on the Microstructure Formation on the Surface of PMMA Plate Using Atmospheric-Pressure Low-Temperature Plasma
(JPST vol.38 No4 p295) |
Ayumu Takada 1, Motoki Tanaka 1, Atsushi Sekiguchi 2,3, and Masashi Yamamoto 1 1 National Institute of Technology, Kagawa College, Japan, 2 Litho Tech Japan Corporation, Japan, 3 Osaka Metropolitan University, Japan |
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Program on Thursday, June 26
Medium Hall on Thursday, June 26
| Symposium | Time | Number | Presentation Title | Authors | |
| A5. EUV Lithography | Chairpersons: Takeo Watanabe (Univ. of Hyogo),
Danilo de Simone (imec) |
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| 09:00-09:30 | A05-01 | Current Challenges in Photoresist (Invited) | Mark Neisser 1,2 1 Tsinghua University, China, 2 International Institute of Tsinghua University, China |
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| 09:30-10:00 | A05-02 | Illuminating the demands high NA EUV will place on next generation photoresists and photomasks (Invited) |
Patrick Naulleau EUV Tech Inc., USA |
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| 10:00-10:20 | Coffee Break | ||||
| Chairpersons: Taku Hirayama (HOYA), Mark Neisser (Tsinghua Univ.) | |||||
| 10:20-10:55 | A05-03 | Double-Deprotected Acids: Polymeric Esters and Acid Amplifiers (Invited) | Seth Kruger 1, Brian Cardineau 2, William Earley, Kenji Hosoi 3, Koichi Miyauchi 3, and Robert L. Brainard 4 1 NYCREATES, USA, 2 Inpria, USA, 3 Central Glass, Japan, 4 University at Albany, USA |
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| 10:55-11:25 | A05-04 | Double Amplification Resists from Acid-Catalyzed Chain-Unzipping of Polyphthalaldehyde-Based Polymers (Invited) |
Rachel Snyder 1, Shintaro Yamada 1, MingQi Li 1, Kyung Hee Oh 2, Jae Hyun Kim 2, Madan Biradar 3, Gokhan Sagdic 3, and Christopher K. Ober 3 1 DuPont Electronics & Industrial, 2 SK hynix Inc., Korea, 3 Cornell University, USA |
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| A4. Computational / Analytical Approach for Lithography Processes | Chairpersons: Kenji Yoshimoto (Kanazawa Univ.),
Sousuke Osawa (JSR) |
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| 11:30-12:00 | A04-01 | Incorporating advanced scanner models in semiconductor manufacturing (Invited) | Wim Tel, Rob Faessen, Philipp Strack, Pieter Smorenberg, Jaap Karssenberg, Hakki Ergun Cekli, and Seiji Nagahara ASML holding Netherlands, the Netherlands |
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| 12:00-13:30 | Lunch time | ||||
| Chairpersons: Kenji Yoshimoto (Kanazawa Univ.), Sousuke Osawa (JSR) | |||||
| 13:30-14:00 | A04-02 | Formulation of Developer Solutions Using Integrated Computational Approaches (Invited) | Yuqing Jin 1, Takehiro Masuda 1, Yuko Tsutsui Ito 1, Takahiro Kozawa 1, Takashi Hasebe 2, Kazuo Sakamoto 2, and Makoto Muramatsu 2 1 SANKEN, Osaka University, Japan, 2 Tokyo Electron Kyusyu Limited, Japan |
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| 14:00-14:30 | A04-03 | Molecular dynamics study of early stages of development process (Invited) | Masaaki Yasuda, Ryuki Tanaka, Kousei Tada, and Hiroto Wakamatsu Osaka Metropolitan University, Japan |
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| 14:30-14:50 | A04-04 | Process and material design for NIL, CMP, and resist synthesis, assisted by Machine learning | Yoshihiko Hirai, Masaru Sasago, Jun Sekiguchi, Takeyasu Saito, and Masaaki Yasuda Osaka Metropolitan University, Japan |
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| 14:50-15:10 | Coffee Break | ||||
| Chairpersons: Masaaki Yasuda (Osaka Metropolitan University),
Kenji Yoshimoto (Kanazawa Univ.) |
|||||
| 15:10-15:40 | A04-05 | Neural Network Molecular Dynamics Simulations on Synthesis Process of MoS2 Thin Films from Molybdenum Ditiocarbamate Molecules (Invited) |
Momoji Kubo Tohoku University, Japan |
||
| 15:40-16:00 | A04-06 | Modeling of interactive junction point in directed self-assembly | Kenji Yoshimoto Kanazawa Univiersity, Japan |
||
| A7. 193 nm Lithography Extension | Chairperson: Yoshio Kawai (Shin-Etsu Chemical) | ||||
| 16:10-16:30 | A07-01 | Development of novel PAG for thick layer photoresist application | Won Seok Lee DuPont Specialty Materials Korea Ltd., Korea |
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| Banquet | 17:30-20:00 | 150 min | Banquet with special events: (Pre-registration or on-site registration is needed) | 14F at HOTEL MONTEREY HIMEJI | |
Small Hall on Thursday, June 26
| Symposium | Time | Number | Presentation Title | Authors | |
| A9. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices |
Chairpersons: Takumi Ueno (Shinshu Univ.), Sanjay Malik (Screen SE) | ||||
| 09:00-09:30 | A09-01 | Next Generation Chiplet Technology Development:Focusing on Fine RDL Patterning (Invited) | Masaru Sasago Osaka Metropolitan University, Japan |
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| 09:30-10:00 | A09-02 | Hybrid Integration for Advanced Electronic-Photonic Packaging (Invited) | Yuma Yoshida, Taiga Sakamoto, Masahiro Matsunaga, Takashi Kawamori, and Masayoshi Nishimoto Resonac Corporation, Japan |
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| 10:00-10:30 | A09-03 | The Development of Novel Polymer Materials for Advanced MEMS Packaging (Invited) | Takenori Fujiwara Toray Industries, Inc., Japan |
||
| 10:30-10:40 | Coffee Break | ||||
| Chairpersons: Guillermo Fernandez Zapico (TSMC Japan), Hitoshi Araki (Toray) | |||||
| 10:40-11:30 | A09-04 | Creating Innovation for Sustainable World in Partnership with Semiconductor Eco System (Keynote) |
Takumi Mikawa SCREEN Semiconductor Solutions, Japan |
||
| 11:30-11:50 | A09-05 | Digital Lithography for SWIR Applications Facilitated by Patterning of Novel IR–Pass Resists | Ksenija Varga 1, Lisa Berger 1, Tobias Zenger 1, Boris Považay 1, Hirotaka Takishita 2, Yoshiki Takahashi 2, Yoshinori Taguchi 2, Johannes Koch 3, and Matthias Schicke 3 1 EV Group, Austria, 2 Fujifilm Electronic Materials Japan, Japan, 3 Fujifilm Electronic Materials Europe |
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| 11:50-12:10 | A09-06 | Rheological properties of resin films containing a polymethacrylate having a urea moiety
(JPST vol.38 No3 p241) |
Hiroshi Matsutani 1, Masahiro Aoshima 1, Kenji Tanaka 1, Bao Li 1, Akitoshi Tanimoto 1, Yasuharu Murakami 1, Xiaodong Ma 2, and Xuesong Jiang 2 1 Resonac Corporation, Japan, 2 Shanghai Jiao Tong University, China |
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| 12:10-14:00 | Lunch | ||||
| Chairpersons: Sanjay Malik (Screen SE),
Masayoshi Nishimoto (Resonac) |
|||||
| 14:00-14:30 | A09-07 | Carrier warpage improvement using non-photosensitive dielectric material for high I/O density organic RDL (Invited) |
Guillermo Fernández TSMC Japan 3DIC |
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| 14:30-15:00 | A09-08 | Development of Negative-tone Photosensitive Dielectric Materials for Fine Pitch RDL in Chiplet Integration (Invited) |
Toshiyuki Ogata TAIYO HOLDINGS CO., LTD., Japan |
||
| 15:00-15:30 | A09-09 | Atomic-level analysis of Cu/polyimide interface under high temperature storage and the investigation of adhesion degradation mechanism (Invited) |
Yugo Kubo Sumitomo Electric Industries, Ltd., Japan |
||
| 15:30-15:40 | Coffee Break | ||||
| Chirpersons: Ksenija Varga (EV Group), Hitoshi Araki (Toray) | |||||
| 15:40-16:30 | A09-10 | Crack Resistance Evaluation Method of Photoimageable Dielectrics for Redistribution Layer | Kenichi Takeuchi, Chiharu Koga, Tomoaki Shibata, Yu Aoki, and Yukika Aoki Resonac Corporation, Japan |
||
| 16:00-16:20 | A09-11 | Enhanced Inductors and Balun Transformers Performance for 5G-6G Applications with Patterned Magnetic Materials with Special Rinse Solution
(JPST vol.38 No2 p71) |
Seiya Masuda, Tetsushi Miyata, Hiroaki Idei, Shota Oi, Hiroyuki Suzuki, and Hidenori Takahashi FUJIFILM Corporation, Japan |
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| 16:20-16:40 | A09-12 | Development of a Novel Negative-Tone Dry Film Resist with PVA Layer for Wiring with 1.5/1.5 µm Line/Space (Invited)
(JPST vol.38 No2 p79) |
Natsuki Toda, Kei Togasaki, Kensuke Yoshihara, Yosuke Kaguchi, Ayane Mochizuki, Kanako Funai, Hitoshi Onozeki, and Kenichi Iwashita Resonac Corporation, Japan |
||
| Banquet | 17:30-20:00 | 150 min | Banquet with special events: (Pre-registration or on-site registration is needed) | 14F at HOTEL MONTEREY HIMEJI | |
Room 408 on Thursday, June 26
| Symposium | Time | Number | Presentation Title | Authors | |
| B2 (Japanese). Plasma Photochemistry and Functionalization of Polymer Surfaces | Chairperson: Tatsuyuki Nakatani (Okayama Univ. of Sci.) | ||||
| 09:30-09:50 | B02-01 | Time Dependence of On the Absorption Spectra of Indigo Carmine Solution | Yuki Jonen 1, Yamato Torii 1, Hirofumi Kurita 2, Tatsuru Shirafuji 1, and Jun-Seok Oh 1 1 Osaka Metropolitan University, Japan, 2 Toyohashi University of Technology, Japan |
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| 09:50-10:10 | B02-02 | Electrical and Optical Characteristics of Atmospheric-Pressure Nitrogen Plasma Using a Micro Hollow Array Electrode |
Fumiya Taniguchi 1, Keishi Yanai 1,2, Tatsuru Shirafuji 1, and Jun-Seok Oh 1 1 Osaka Metropolitan University, Japan, 2 Asahi Polyslider Co., Ltd., Japan |
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| 10:10-10:30 | B02-03 | Modulating the Concentrations of Reactive Oxygen and Nitrogen Species in Plasma-activated Water Using Dielectric Barrier Discharge with Various Gases |
Soma Hosoi 1, Naoki Azuma 1, Sushil Kumar KC 2, Endre J. Szili2, Akimitsu Hatta 3, Tatsuru Shirafuji 1, and Jun-Seok Oh 1 1 Osaka Metropolitan University, Japan, 2 University of South Australia, Australia, 3 Kochi University of Technology, Japan |
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| 10:30-10:50 | B02-04 | Modification of Polymer Surface Using Ozone | Hiroto Mori 1, Kohei Yamashita 1, Tatsuru Shirafuji 1, Jun-Seok Oh 1, and Akimitsu Hatta 2 1 Osaka Metropolitan University, Japan, 2 Kochi University of Technology, Japan |
||
| 10:50-11:00 | Coffee Break | ||||
| Chairperson: Jun-Seok Oh (Osaka Metropolitan University) | |||||
| 11:00-11:20 | B02-05 | RF-PECVD法により成膜されたDLC膜へのスペクトルデータ駆動科学の適用
(JPST vol.38 No1 p57) |
小佐野 芳寿 1,2, 中谷 達行 1,3 1 岡山理科大学, 2 三菱鉛筆株式会社, 3 慶應義塾大学 |
||
| 11:20-11:40 | B02-06 | 圧力勾配型スパッタ法がDLC膜の成膜と膜特性に及ぼす影響 | 米澤 健 1,2, 小佐野 芳寿 1, 中谷 達行 1,3 1 岡山理科大学, 2 ケニックス株式会社, 3 慶應義塾大学 |
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| 11:40-12:00 | B02-07 | 疎水性鎖にピリジル基を有する両親媒性ブロック共重合体の構築とそのpH応答性高分子ミセルへの応用 | 近藤 伸一1, 土井 直樹1, 笹井 泰志2, 山内 行玄3 1 岐阜薬科大学, 2 岐阜医療科学大学, 3松山大学 |
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| Banquet | 17:30-20:00 | 150 min | Banquet with special events: (Pre-registration or on-site registration is needed) | 14F at HOTEL MONTEREY HIMEJI | |
Room409 on Thursday, June 26
| Symposium | Time | Number | Presentation Title | Authors | |
| B3-5(Japanese) General Scopes of Photopolymer Science and Technology |
Chairpersons: Hideo Horibe (Osaka Metropolitan University),
Masashi Yamamoto (Kagawa KOSEN) |
||||
| 10:00-10:20 | B03-01 | レーザーを用いたレジスト剥離における走査照射条件の最適化 | 森下 沙夢 1, 面地 和樹 1, 安國 良平 1, 吉村 政志 2, 山本 竜也 3, 堀邊 英夫 3, 神村 共住 1,2 1 大阪工業大学, 2 大阪大学, 3 大阪公立大学 |
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| 10:20-10:40 | B03-02 | 回転円盤上における二流体ジェット噴射によって形成された液膜構造
(JPST vol.38 No2 p117) |
池ヶ谷 充貴也 1, 土居 尚人 1, 高橋 広毅 2, 今井 正芳 2, 真田 俊之 1 1 静岡大学, 2 荏原製作所 |
||
| 10:40-11:05 | B03-03 | マイクロ波励起水蒸気プラズマアッシングプロセスにおける基板ホルダへのRFバイアス電圧印加効果 (Invited) | 石島達夫 金沢大学 |
||
| 11:05-11:15 | Coffee Break | ||||
| Chairpersons: Tatsuo Ishijima (Kanazawa Univ.),
Toshiyuki Sanada (Shizuoka Univ.) |
|||||
| 11:15-11:35 | B03-04 | 三成分化学増幅型感光性ポリイミドにおけるカルボン酸型溶解抑制剤による感度と解像度の向上
(JPST vol.38 No4 p277) |
Daiki Madokoro 1, Katsuaki Takashima 1, Kohei Yamaoka 2, Susumu Tanaka 2, Tomoyuki Yuba 2, and Hideo Horibe 1 1 Osaka Metropolitan University, Japan, 2 Toray Industries, Inc., Japan |
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| 11:35-11:55 | B03-05 | ３成分化学増幅型ノボラックレジストにおける溶解抑制剤の脱保護活性化エネルギーの評価（２）
(JPST vol.38 No3 p211) |
井東七ツ希, 間所大貴, 髙嶋克彰, 堀邊英夫 大阪公立大学 |
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| 11:55-12:15 | B03-06 | 3成分化学増幅型レジストにおける溶解抑制剤の化学構造とレジスト特性との関係
(JPST vol.38 No3 p231) |
嶋田野乃佳, 髙嶋克彰, 堀邊英夫 大阪公立大学 |
||
| A13 & B1(Japanese) Polyimides and High Thermally Stable Resins -Functionalization and Practical Applications- |
Chairperson: Teruaki Hayakawa (Institute of Science Tokyo) | ||||
| 13:00-13:30 | B01-01 | Nonstoichiometric Step-Growth Polymerization Based on Intramolecular Catalyst Transfer System (Invited)
(JPST vol.38 No2 p111) |
Tomoya Higashihara Yamagata University, Japan |
||
| 13:30-13:50 | A13-01 | Highly Reliable Polyimide-based Thermal Interface Material Sheet for Power Modules
(JPST vol.38 No3 p237) |
Hiroki Mori, Yohei Sakabe, and Akira Shimada Toray Industries, Inc., Japan |
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| Chairperson: Hitoshi Araki (Toray) | |||||
| 13:50-14:10 | A13-02 | Synthesis of Low Dielectric Poly(esterimide)s Incorporating Double-Decker Silsesquioxane Units
(JPST vol.38 No2 p137) |
Natsuko Sashi, Erina Yoshida, Hayato Maeda, Kan Hatakeyama-Sato, Yuta Nabae, Ririka Sawada, Shinji Ando, and Teruaki Hayakawa Institute of Science Tokyo, Japan |
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| 14:10-14:20 | Coffee Break | ||||
| 14:20-14:40 | A13-03 | Synthesis and Dielectric Properties of Silicon-Containing Hydrocarbon-Based Polymers via Hydrosilylation Polymerization |
Yuka Azuma, Riku Takahashi, Kan Hatakeyama-Sato, Yuta Nabae, and Teruaki Hayakawa Institute of Science Tokyo, Japan |
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| 14:40-15:00 | A13-04 | Synthesis and Dielectric Properties of Poly(phenylene ether) Bearing Bulky Side Chains | Kentaro Sone, Hayato Maeda, Kan Hatakeyama-Sato, Yuta Nabae, and Teruaki Hayakawa Institute of Science Tokyo, Japan |
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| Chairperson: Kenji Miyao (Sumitomo Bakelite) | |||||
| 15:00-15:20 | A13-05 | Influence of alkyl length on the morphology and higher-order structure of poly(amic acid) flower-like particles
(JPST vol.38 No3 p159) |
Yuqian Chen, Kan Hatakeyama-Sato, Yuta Nabae, and Teruaki Hayakawa Institute of Science Tokyo, Japan |
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| 15:20-15:40 | A13-06 | Synthesis of Negative-Type Photosensitive Polyimides Using 2-Hydroxyethyl Methacrylate as a Crosslinking Agent and their Dielectric Constant and Dielectric Loss Tangent. |
Koki Matsuo 1, Hayato Maeda 1, Riku Takahashi 1, Makiko Irie 2, Kazuaki Ebisawa 2, Kan Hatakeyama-Sato 1, Yuta Nabae 1, and Teruaki Hayakawa 1 1 Institute of Science Tokyo, Japan, 2 Tokyo Ohka Kogyo Co. Ltd., Japan |
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| 15:40-16:00 | A13-07 | Synthesis and Characterization of an Epoxy Monomer with Six Epoxy Groups and its Thermosetting Resin |
Takahisa Hiramatsu, Rika Marui, Kan Hatakeyama-Sato, Yuta Nabae, and Teruaki Hayakawa Institute of Science Tokyo, Japan |
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| Banquet | 17:30-20:00 | 150 min | Banquet with special events: (Pre-registration or on-site registration is needed) | 14F at HOTEL MONTEREY HIMEJI | |
Program on FRIday, June 27
Medium Hall on Friday, June 27
| Symposium | Time | Number | Presentation Title | Authors | |
| A5. EUV Lithography | Chairpersons: Takeo Watanabe (Univ. of Hyogo),
Ethan Choong Bong Lee (Samsung SDI) |
||||
| 09:00-09:30 | A05-05 | Patterning materials in the era of high NA EUV Lithography (Invited) | Danilo De Simone IMEC, Belgium |
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| 09:30-10:00 | A05-06 | EUV-FEL as a future light source for advanced lithography (Invited) | Hiroshi Kawata, Yosuke Honda, Norio Nakamura, Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yoshinori Tanimoto, Miho Shimada, Masahiro Yamamoto, Takanori Tanikawa, Olga Tanaka, Takashi Obina, Shinichiro Michizono High Energy Accelerator Research Organization (KEK), Japan |
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| 10:00-10:30 | A05-07 | New Activity of EUV Light Source for Semiconductor Manufacturing in Kyushu-University (Invited) |
Yukihiko Yamagata 1, Hakaru Mizoguchi 1,2, Kentaro Tomita 3, Daisuke Nakamura 1, Takeshi Hi-gashiguchi 4, Atsushi Sunahara 5, Katsunobu Nishihara 6, Takashi Toshima 2, Hiroki Kondo 1, Takuji Sakamoto 2, Tanemasa Asano 2 and Masaharu Shiratani 1,2 1 Kyush University, Japan, 2 EUV Photon Co. Ltd., Japan, 3 Hokkaido University, Japan, 4 Utsunomiya University, Japan, 5 Purdue University, USA, 6 Osaka University, Japan |
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| 10:30-10:50 | Coffee Break | ||||
| Chairpersons: Hiroto Kudoh (Kansai Univ.), Patrick Naulleau (EUV Tech) | |||||
| 10:50-11:10 | A05-08 | Development of Beyond EUV Interference Lithography tool at NewSUBARU | Ryuta Shiga, Shinji Yamakawa, and Tetsuo Harada University of Hyogo, Japan |
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| 11:10-11:30 | A05-09 | Evaluation of Resists Exposed using sub-200 eV Electron Beam towards Beyond-EUV Lithography. | Ryuichi Yamasaki, Shinji Yamakawa, and Tetsuo Harada University of Hyogo, Japan |
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| 11:30-12:00 | A05-10 | Resist imaging by laser-based photoemission electron microscopy (Invited) | Toshiyuki Taniuchi The University of Tokyo, Japan |
||
| 12:00-12:20 | A05-11 | Acquisition of micron-scale chemical mapping image of resist by PEEM | Shinji Yamakawa, Tsukasa Sasakura, and Tetsuo Harada University of Hyogo, Japan |
||
| 12:20-14:00 | Lunch | ||||
| Chairpersons: Shinji Yamakawa (Univ. of Hyogo),
Robert Brainard (SUNY) |
|||||
| 14:00-14:30 | A05-12 | Inspection of next generation hybrid EUV resists with NP-SIMS (Invited) | Gregrey Swieca 1, Won-Il Lee 2, Shixian Ha 2, Nikhil Tiwale 3, Chang-Yong Nam 2,3, and Michael J. Eller 1 1 California State University, USA, 2 Stony Brook University, USA, 3 Brookhaven National Laboratory, USA |
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| 14:30-15:00 | A05-13 | Characterization of latent image of photoresist via critical-dimension resonant soft X-ray scattering (Invited) |
Qi Zhang, Kas Andrle, Weilun Chao, Zhengxing Peng, Warren Holcomb, Ryan Miyakawa, Dinesh Kumar, Alexander Hexemer, Patrick Naulleau, Bruno La Fontaine, Ricardo Ruiz, and Cheng Wang Lawrence Berkeley National Lab, USA |
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| 15:00-15:20 | A05-14 | Nanoscale resist pattern defects clustered in the micron region found by soft X-ray microscopy
(JPST vol.38 No2 p145) |
Takeharu Motokawa 1, Shuhei Iguchi 2, Shinji Yamakawa 2, Tetsuo Harada 2, and Takeo Watanabe 2 1 KIOXIA Corporation, Japan, 2 University of Hyogo, Japan |
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| 15:20-15:40 | Coffee Break | ||||
| Chairpersons: Sousuke Oosawa (JSR),
Michael Eller (California State Univ.) |
|||||
| 15:40-16:00 | A05-15 | Evaluation of Inorganic-organic Hybrid Resist Materials with ultrafast coherent high harmonic generation (HHG) EUV system developed in QST
(JPST vol.38 No3 p217) |
Hiroki Yamamoto, Thanh-Hung Dinh, and Masahiko Ishino National Institutes for Quantum Science and Technology (QST), Japan |
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| 16:00-16:20 | A05-16 | Multi-Trigger Resists: Modeling and Simulation Results | Thiago J. dos Santos 1, Andreas Erdmann 1, Alex P. G. Robinson 2, 3, Alexandra McClelland 2, Carmen Popescu 2, Bernardo Oyarzún 4, Joost van Bree 4, and Mark van de Kerkhof 4 1 Fraunhofer Institute for Integrated Systems and Device Technol., Germany, 2 Irresistible Materials, UK, 3 University of Birmingham, UK, 4 ASML Netherlands, the Netherlands |
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| 16:20-16:40 | A05-17 | PFAS-free rinse materials for pattern collapse mitigation in EUV lithography
(JPST vol.38 No4 p259) |
Raymond Jin, Kazuma Yamamoto, Naoki Matsumoto, Maki Ishii, Miho Yamaguchi, Yusuke Hama, and Takuo Endo Merck Electronics, Japan |
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| Closing Remarks |
16:45-16:55 | CR | Closing Remarks | Takeo Watanabe SPST |
|
Small Hall on Friday, June 27
| Symposium | Time | Number | Presentation Title | Authors | |
| A10. Chemistry for Advanced Photopolymer Science | Chairpersons: Haruyuki Okamura (Osaka Metropolitan Univ.),
Zhiquan Li (Guangdong Univ. Technol.) |
||||
| 13:00-13:25 | A10-01 | Breaking boundaries of photoinitiators: new ways to improve the reactivity of radical photopolymerization (Invited)
(JPST vol.38 No1 p65) |
Xavier Allonas Univeristy of Haute Alsace, France |
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| 13:25-13:45 | A10-02 | A Predictive Model for Polymerization Shrinkage Stress Derived from Photocuring Kinetics
(JPST vol.38 No1 p51) |
Gaoxiang Luo, Yusuke Hiejima, and Kentaro Taki Kanazawa university, Japan |
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| 13:45-14:05 | A10-03 | In-situ investigation of as-cast homopolymer-based resists | Markus Langner 1, Gregrey Swieca 1, Won-Il Lee 2, Shixian Ha 2, Nikhil Tiwale 3, Chang-Yong Nam 2,3, and Michael J. Eller 1 1 California State University, USA, 2 Stony Brook University, USA, 3 Brookhaven National Laboratory, USA |
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| 14:05-14:25 | A10-04 | Machine Learning-Assisted Dissolution Behavior Investigation of ArF Lithographic Materials | Xia Lin 1, Xiyan Dong 2, Haofan Ji 1, Yuhua Li 1, Yisong Huo 1, Wei Li 1, Liwen Mu 2, Xiaohua Lu 2, and Ruzhi M Zhang 1 1 Suzhou Laboratory, China, 2 Nanjing Tech University, China |
||
| 14:25-14:40 | Coffee Break | ||||
| Chairpersons: Kentaro Taki (Kanazawa Univ.),
Xavier Allonas (Univ. Haute Alsace) |
|||||
| 14:40-15:05 | A10-05 | NIR induced anionic photopolymerization based on upconversion photochemistry (Invited) | Quanping Xie, Yaoxin Huang, Pin Yang, and Zhiquan Li Guangdong University of Technology, China |
||
| 15:05-15:25 | A10-06 | Interference of Photobase generators on Covalent Bond Exchanges in Vinylogous Urea Vitrimers
(JPST vol.38 No2 p103) |
Kanji Suyama 1, Hirokazu Hayashi 2, and Hideki Tachi 2 1 Osaka Metropolitan University, Japan, 2 Osaka Research Institute of Industrial Science and Technology (ORIST), Japan |
||
| 15:25-15:45 | A10-07 | Relationship between photochemical properties of oxime esters and their efficiency as photoinitiators for free radical induced photopolymerization
(JPST vol.38 No2 p151) |
Arthur Guenan1, Xavier Allonas 1, L. Feiler 2, R. Frantz 3, and Céline Croutxé-Barghorn 1 1 University of Haute Alsace, France, 2 BASF Schweiz AG, Switzerland |
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| 15:45-16:05 | A10-08 | Photocured Blended Films of Diarylfluorene having Naphthalene Moieties and TiO2 with High Refractive Indices
(JPST vol.38 No1 p35) |
Haruyuki Okamura 1, Keiko Minokami 2, and Shinsuke Miyauchi 2 1 Osaka Metropolitan University, Japan, 2 Osaka Gas Chemicals, Japan |
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Room 408 on Friday, June 27
| Symposium | Time | Number | Presentation Title | Authors | |
| A11. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices | Chairpersons: Itaru Osaka (Hiroshima Univ.),
Hideo Ohkita (Kyoto Univ.) |
||||
| 09:00-09:35 | A11-01 | Design of low complexity active materials for photovoltaic applications (Keynote) | Martin Heeney King Abdullah University of Science and Technology (KAUST), Saudi Arabia |
||
| 09:35-10:00 | A11-02 | Development of Fused-Ring Acceptors for Green-Light Wavelength-Selective Organic Solar Cells (Invited)
(JPST vol.38 No4 p285) |
Seihou Jinnai, Yuto Shiono, and Yutaka Ie Osaka Univeristy, Japan |
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| 10:00-10:15 | A11-03 | A Strategically Designed Easily-Synthesized Polymer Donor for Efficient Organic Photovoltaics |
Kodai Yamanaka, Tsubasa Mikie, Itaru Osaka Hiroshima University, Japan |
||
| 10:15-10:25 | Coffee Break | ||||
| Chairpersons: Itaru Osaka (Hiroshima Univ.),
Hideo Ohkita (Kyoto Univ.) |
|||||
| 10:25-10:50 | A11-04 | Charge Accumulation Behavior and Persistent Luminescence in Organic Materials (Invited) | Ryota Kabe OIST, Japan |
||
| 10:50-11:15 | A11-05 | Organic/Hybrid Thermoelectric Materials and Devices (Invited) | Cheng-Liang Liu, National Taiwan University, Taiwan |
||
| 11:15-11:30 | A11-06 | Fabrication of Organic Field Effect Transistor Using Low Temperature Annealed Fluorinated Block Copolymer |
Tangjun Zhang, Xiaofei Qian, and Hai Deng Fudan University, China |
||
| 11:30-12:50 | Lunch | ||||
| Chairpersons: Itaru Osaka (Hiroshima Univ.),
Hideo Ohkita (Kyoto Univ.) |
|||||
| 12:50-13:15 | A11-07 | Synthesis and Photovoltaic Properties of Non-Fullerene Acceptors with Quinoxaline-Based Central Unit (Invited)
(JPST vol.38 No3 p197) |
Tomokazu Umeyama, Kaho Yasuzato, Seiya Sugiura, Kenta Yamada, Jun-ichi Inamoto, Shunjiro Fujii, and Wataru Suzuki University of Hyogo, Japan |
||
| 13:15-13:40 | A11-08 | Influence of Vibronic Interactions on Charge Transfer Excitons in Nonfullerene Organic Photovoltaics (Invited) |
Azusa Muraoka Japan Women's University, Japan |
||
| 13:40-14:05 | A11-09 | ESR analysis of charge-transporting materials in non-fullerene organic solar cells (Invited)
(JPST vol.38 No2 p121) |
Atsushi Sato, and Kazuhiro Marumoto University of Tsukuba, Japan |
||
| 14:05-14:15 | Coffee Break | ||||
| Chairpersons: Itaru Osaka (Hiroshima Univ.),
Hideo Ohkita (Kyoto Univ.) |
|||||
| 14:15-14:40 | A11-10 | Enhancement of Organic Solar Cell Efficiency via Incorporation of Lead Sulfide Quantum Dots (Invited) |
Qing Shen, Kei Takahashi, Yuyao Wei, Taro Toyoda, and Shuzi Hayase The University of Electro-Communications, Japan |
||
| 14:40-15:05 | A11-11 | Charge carrier dynamics at lead halide perovskite (Invited) | Yasuhiro Tachiana 1,2 1 RMIT University, Australia, 2 Osaka University, Japan |
||
| 15:05-15:20 | A11-12 | Charge Transfer at the PEDOT:PSS/Perovskite Interface in RP Sn Perovskite Solar Cells Elucidated by Operando ESR Spectroscopy |
Yizhou Chen, Seira Yamaguchi, Atsushi Sato, Kaito Inoue, and Kazuhiro Marumoto University of Tsukuba, Japan |
||
| 15:20-15:30 | Coffee Break | ||||
| Chairpersons: Itaru Osaka (Hiroshima Univ.),
Hideo Ohkita (Kyoto Univ.) |
|||||
| 15:30-15:55 | A11-13 | Chlorine-mediated organic conjugated materials and quasi-planar heterojunction devices (Invited) |
Feng He Southern University of Science and Technology, China |
||
| 15:55-16:20 | A11-14 | Molecular Orientation and Structure Controls from Film Surface for Organic Electronics (Invited) |
Keisuke Tajima RIKEN Center for Emergent Matter Science (CEMS), Japan |
||
| 16:20-16:45 | A11-15 | Development of Efficient Porphyrin Sensitizers for Dye-Sensitized Solar Cells Using Copper Redox Shuttles (Invited) |
Tomohiro Higashino Kyoto University, Japan |
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Room 409 on Friday, June 27
| Symposium | Time | Number | Presentation Title | Authors | |
| B3. General Scopes of Photopolymer Science and Technology | Chairperson: Teruaki Hayakawa (Institute of Science Tokyo) | ||||
| 09:00-09:20 | B03-07 | Glycidyl Methacrylate-Grafted Polysilanes: Synthesis and Properties
(JPST vol.38 No1 p41) |
Yukihito Matsuura 1, Sakino Kikuchi 1, and Tomoharu Tachikawa 2 1 National Institute of Technology, Nara College, Japan, 2 Osaka, Gas Chemicals Co., Ltd., Japan |
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| 09:20-09:40 | B03-08 | アゾベンゼン系分子ガラス微粒子のヒドロキシプロピルセルロースハイドロゲル中におけるキラルフォトメカニカル挙動 | 青松義貴 1、大背戸豊 2、倉賀野正弘 1、徳樂清孝 1、中野英之 1 1 室蘭工大，2 奈良女子大 |
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| 09:40-10:00 | B03-09 | 三つのシアノスチルベン骨格を有する新規アモルファス分子蛍光体を用いる発光パターン形成
(JPST vol.38 No1 p29) |
島崎唯人、中野英之 室蘭工大 |
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| 10:00-10:20 | B03-10 | ヒドロキシピリジル基を導入したメタクリル光接着材料の作製
(JPST vol.38 No3 p169) |
古谷 昌大、松井 実玖 福井工業高専 |
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| 10:20-10:40 | B03-11 | チオキサントン骨格並びにα–解裂型骨格を有する複合型光ラジカル重合開始剤 | 宮川 信一、小林 彪真 千葉大学 |
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